Scrubber for epitaxy reactors

Featuring three abatement stages for CVD (AP-, LP-, PE-) reactors, with gas flows including Hydrogen, Nitrogen, Hydrochloric, SiH 4 - DCS - TCS sources, dopant Hydrides. These units guarantee TWA emissions below 20 ppb, maintaining a constant programmable vacuum level in the reactors exhaust lines for gas flowrate variations within 0 to 100% rated values. The vacuum level in suction side, as well for the positive pressure from the exhaust one, are internally generated: our units may then work equally well either with an operating House Scrubbing and without, granting constant laminar flow for all EPI processes. In the first stage the incoming gas enters in intimate contact with the neutralizing solution, passing in the transparent inlet bells: here, the source decomposes forming SiO 2 flakes that incorporate most of the dopants. The flakes are then evacuated through the overflow liquid trap in the base tank. The second stage is a turret with packing rings and sprayers, where the absorption of slow soluble Hydrides and Hydrochloric takes place: the remaining humid gas flow is drawn to the third stage. The latter is a Venturi jet ejector, fed by the neutralizing solution pump: this stage abates the residual solutes and forces the gas to the exhaust chimney.